The role of applied bias on the properties of HiPIMS deposited nc-TiC/a-C:H coatings

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Authors

SOUČEK Pavel HNILICA Jaroslav ZÁBRANSKÝ Lukáš BURŠÍKOVÁ Vilma STUPAVSKÁ Monika VAŠINA Petr

Year of publication 2018
Type Conference abstract
MU Faculty or unit

Faculty of Science

Citation
Description Nanocomposite coatings consisting of nanocrystallites embedded in an amorphous matrix such as nc-TiC/a-C:H can be tailored to exhibit an unusual combination of properties like high hardness and elastic modulus combined with low friction and wear. These coatings are usually deposited utilising direct current magnetron sputtering (DCMS) leading to low ionisation of the sputtered titanium and to lower Ar+ ion bombardment impinging the growing coating. The ion bombardment of the substrates is routinely enhanced via increasing the energy of the bombarding ions due to the application of a negative bias onto the samples. The use of high power impulse magnetron sputtering (HiPIMS) usually leads to much higher ionisation of the sputtered titanium which can alter the deposition process and to more severe ion bombardment of the growing coating changing the properties of the deposited coatings.
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