Assessment of non-uniform thin films using spectroscopic ellipsometry and imaging spectroscopic reflectometry

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Authors

NEČAS David OHLÍDAL Ivan FRANTA Daniel ČUDEK Vladimír OHLÍDAL Miloslav VODÁK Jiří SLÁDKOVÁ Lucia ZAJÍČKOVÁ Lenka ELIÁŠ Marek VIZĎA František

Year of publication 2014
Type Article in Periodical
Magazine / Source Thin Solid Films
MU Faculty or unit

Central European Institute of Technology

Citation
Web http://ac.els-cdn.com/S0040609013021007/1-s2.0-S0040609013021007-main.pdf?_tid=83eecb72-d868-11e4-9e7b-00000aab0f6c&acdnat=1427890593_5f13d02ce4a284783378d30a332962c6
Doi http://dx.doi.org/10.1016/j.tsf.2013.12.036
Field Solid matter physics and magnetism
Keywords Variable-angle spectroscopic ellipsometry; Mapping spectroscopic ellipsometry; Imaging spectroscopic reflectometry; Non-uniform thin films
Attached files
Description Standard variable-angle spectroscopic ellipsometry, mapping spectroscopic ellipsometry with microspot and imaging spectroscopic reflectometry are applied to optical characterisation of a thin SiOxCyHz film considerably non-uniform in thickness and which is also suspected of non-uniformity also in the optical constants. It is shown that using the combination of these three optical methods, enables us to determine the spectral dependencies of the optical constants of the film together with parameters characterising the shape of thickness non-uniformity and fine map of local thickness. The mapping spectroscopic ellipsometry with microspot enables deciding whether the film is non-uniform in optical constants. For the thin film studied it is found that the non-uniformity in optical constants is under experimental accuracy. The consistency of results obtained using individual techniques is checked and the advantages and disadvantages of the techniques are discussed. (C) 2013 Elsevier B.V. All rights reserved.
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