Hybrid PVD-PECVD Process and Its Application for Carbon Ritch Nanocomposite Thin Film Deposition

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Authors	VAŠINA Petr SCHMIDTOVÁ Tereza SOUČEK Pavel BURŠÍKOVÁ Vilma
Year of publication	2012
Type	Article in Proceedings
Conference	Vrstvy a povlaky 2010: Zborník prednášok
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	hybrid PVD-PECVD; magnetron sputtering
Description	This paper dsiscusses the tybrid PVD-PECVD process and its application for carbon ritch nanocomposite thin film deposition
Related projects:	CEPLANT - Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy Porozumění hybridnímu PVD-PECVD procesu s cílem řídit růst nanostrukturovaných kompozitních vrstev